Hengyun Chang: The company has always been committed to becoming a platform-based company that provides comprehensive solutions for core components around plasma processes.

Securities Daily, March 17—In response to questions from research participants, Hengyun Chang said that Mr. Leyu Ping held positions at the Telecommunications Equipment Factory of the Post and Telecommunications Bureau of Taojiang County, Hunan Province from July 1995 to February 2002, serving as a technician and engineer; from March 2003 to May 2006, he worked at AE (Shenzhen) as a testing technician and engineer; from June 2006 to April 2014, he worked at AE (Shanghai) as a product application engineer and senior sales manager; from May 2014 to September 2021, he worked at the Company as executive director and general manager; from September 2021 to the present, he has served as the Company’s chairman and general manager. The Company was established in 2013. In its early stage, its primary business focused on introducing core components for vacuum equipment, and its self-developed products were in an initial exploration phase. In 2018, the Company entered a period of rapid development. Significant breakthroughs were achieved in semiconductor-related applications of the Company’s self-developed products, realizing technological breakthroughs in semiconductor-grade plasma RF power supply systems. The Bestda series of plasma RF power supply systems were developed to enable equipment vendors’ validation and were shipped in batches. In 2023, the Company entered a stage of continuous innovation. The Company’s self-developed products have become the driver of its business. In addition, the Company continues to provide on-site replacement and maintenance services for plasma RF power supply systems for wafer fabs. Meanwhile, during this phase, the Company overcame technical challenges in advanced process technologies and developed the Aspen/Basalt series of plasma RF power supply systems, completing product generation upgrades. The process stages for which it is used have also expanded from thin-film deposition to large-scale batch applications in etching. At the same time, products such as the Torrent series remote plasma sources and the Ginkgo series DC power supplies have also been developed one after another, achieving delivery of some small batches and further enriching the Company’s product lineup. During this phase, the Company also broke through advanced technologies such as plasma arc detection and control, and pulse control of plasma bias voltages. The Company entered a rapid growth channel, and its business scale continued to expand. The Company has always been committed to becoming a platform-type company that provides comprehensive overall solutions for core components centered on plasma process technology.

(Source: Securities Daily)

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